IWDTF2025にて講演予定

​2025年10月11日​学会・会議

11月5日から7日まで仙台市戦災復興記念館（仙台市）にて開催される2025 International Workshop on “Dielectric Thin Films for Future Electron Devices: Science and Technology” (IWDTF2025) にて2件の講演を行います。
https://pub.confit.atlas.jp/en/event/iwdtf2025

Oral/S5-02
“Oxygen Pressure Dependence of Linear-Parabolic Growth Retardation on Si(111)"
*Hengyu Wen¹, Yasutaka Tsuda², Yuki Okabe¹, Akitaka Yoshigoe², Jiayi Tang³, Yuji Takakuwa⁴, Shuichi Ogawa¹
(1. Nihon University (Japan), 2. JAEA (Japan), 3. JASRI (Japan), 4. Tohoku University (Japan))

Oral/S5-03
“Cooperation Mechanism between Single- and Double-Step Oxidation Reaction Loops during Dry Oxidation on p-Si(001) and n-Si(001) Surfaces"
*Yuki Okabe¹, Yasutaka Tsuda², Hengyu Wen¹, Akitaka Yoshigoe², Yuji Takakuwa³, Shuichi Ogawa¹ 
(1. Nihon University (Japan), 2. JAEA (Japan), 3. Tohoku University (Japan))